Physical vapor deposition (PVD) - thin layer deposion

what is PVD?

Vapor Deposition is the English term for surface treatment through vapor. This vapor may be produced by Chemical reactions (CVD) or physical reactions (PVD). Chemical reactions occur at high temperatures (from 800 °C). Physical reactions occur from a plasma, which means that exactly through these reactions at very low temperatures (starting at room temperature), layers can be added. PVD can be applied to metals but also on ceramics, glass and plastics. These techniques originate combinations with unique properties.

fields of application

Typical thicknesses range from a couple of nanometers to 6μm. The possibilities for applying coatings are endless and depend on the properties you want to add to the base material. Metallic coatings can be applied that can, for example, increase the electrical conductivity, improve the corrosion properties or be used for (optical) reflection. Ceramic coatings can improve wear resistance or add optical properties to materials. Furthermore, these layers are perfectly combinable with galvanic bases originating combinations that excel in wear resistance combined with corrosion properties.